CHY-T12100A-3Z4C 1200 degree CVD system for Garaphene Film Preparation

CHY-T12100A-3Z4C 1200 degree CVD system for Garaphene Film Preparation  CHENGYI CVD System  CVD machine price

1.O.D100*1000mm high purity quartz tube
2.High quality ceramic fiber chamber
3.PID Programmable controller
4.Three gas way mass flow controller with precision gas flow controller
5.Two stage Vacuum Pump
5.Made by Henan Chengyi

1.Laboratory heat thermal processing
2.High Vacuum Sintering Heating Annealing Brazing
3.Laboratory Thin Film Preparation,Nano tube growthing
4.Laboratory CVD system,graphene growthing,preparation.

1200 degree CVD system PARAMETERS
Product Name
Modle No.
CHY-T12100A-3Z4C
Heating zones
Single heating zone
Heating zone length
400mm
Constant temperature zone length
200mm
Tube Material
high purity quartz tube
Tube diameter
O.D100*I.D94*1000mm Quartz Tube
Tube Length
1000mm,750mm,1000mm,1200mm as enquiry
Thermcouple
K type
Maximum heating temper
1150 dgree
Heating rate
20c/min,adjustable suggestion 10 degree/min
Heating element
Fe-Co-Al by Mo alloy
Sealing Method
stainless steel vacuum flange
Vacuum Air-tightness
9.8×10-4Pa
Temperature Accuracy
±1℃
Control Mode
Intelligent PID programmable Control,30 steps sintering curve restore
Mass Flow Controller
3 gas way mass flow controller
Flowmeter Core
304 stainless steel
Measure Accuracy
+/- 1.0% F.S
Pressure Range
-0.1~0.15MPa
A way gas range
0~100SCCM
B way gas range
0~200SCCM
C way gas range
0~500SCCM,or as customized
Vacuum Pump
4C
Power Supply
AC220V  50Hz

Our CVD machine has three gas way mass flow controller with precision gas flow controller. Our products are very popular, please contact us as soon as possible!


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